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Gigaphoton Achieves a Decrease in Collector Mirror Reflectance of -0.4 % / Bpls for EUV Pilot Light Sources

2017-09-12 - NEWSWIRE

Gigaphoton Achieves a Decrease in Collector Mirror Reflectance of -0.4 % / Bpls for EUV Pilot Light Sources

Gigaphoton Inc., a leading manufacturer of light sources used in semiconductor lithography, announced with regard to their current development of Laser-Produced Plasma (LPP) light sources for EUV scanners, that a decrease in collector mirror reflectance of -0.4 % / Bpls has been achieved for their pilot light sources. Note) These sources are expected to operate in leading-edge semiconductor mass-production lines and this marks a major step forward in the resolution of bottlenecks. This summer…
Source: Gigaphoton Achieves a Decrease in Collector Mirror Reflectance of -0.4 % / Bpls for EUV Pilot Light Sources

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